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Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber
- 1.Pokorný, P., Musil, J., Fitl, P., Novotný, M., Lančok, J., Bulíř, J. Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber. Plasma Processes and Polymers. 2015, 12(5), 416-421. ISSN 1612-8850. E-ISSN 1612-8869. Dostupné z: doi: 10.1002/ppap.201400172
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