Počet záznamů: 1  

Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber

  1. 1.
    0449004 - FZU-D 2016 RIV DE eng J - Článek v odborném periodiku
    Pokorný, Petr - Musil, Jindřich - Fitl, Přemysl - Novotný, Michal - Lančok, Ján - Bulíř, Jiří
    Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber.
    Plasma Processes and Polymers. Roč. 12, č. 5 (2015), s. 416-421. ISSN 1612-8850
    Grant CEP: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/1312; GA ČR(CZ) GAP108/11/0958; GA ČR(CZ) GA14-10279S
    Institucionální podpora: RVO:68378271
    Klíčová slova: contamination * low-pressure discharges * magnetron * metallic films * sputtering
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
    Impakt faktor: 2.713, rok: 2015

    The article reports on the contamination of Ag thin films sputtered from a pure Ag target in Ar and Ne gas by the RF magnetron by gas atoms contained in residual gas atmosphere in the deposition chamber at different values of the base pressure. The amount of O atoms generated at different values of base pressure is compared with the amount of Ag atoms sputtered at different deposition rates of Ag film. This comparison reveals a great problem in the formation of pure metallic films at low deposition rates and high values of the base pressure. No pure Ag films can be deposited at low in deposition chambers evacuated with diffusion or root pumps to the base pressures lower than 1mPa only.
    Trvalý link: http://hdl.handle.net/11104/0250593