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Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems
- 1.Čada, M., Virostko, P., Kment, Š., Hubička, Z. Comparative study of total power density at a substrate in pulsed DC magnetron and hollow-cathode plasma jet sputtering systems. Plasma Processes and Polymers. 2009, 6(S1), S247-S252. ISSN 1612-8850. E-ISSN 1612-8869. Dostupné z: doi: 10.1002/ppap.200930611
Počet záznamů: 1