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Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber
- 1.POKORNÝ, P., MUSIL, J., FITL, P., NOVOTNÝ, M., LANČOK, J., BULÍŘ, J. Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber. Plasma Processes and Polymers. 2015, 12(5), 416-421. ISSN 1612-8850. E-ISSN 1612-8869. Dostupné z: https://doi.org/10.1002/ppap.201400172
Počet záznamů: 1