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Mechanical properties and microstructural characterization of amorphous SiC.sub.x./sub.N.sub.y./sub. thin films after annealing beyond 1100°C
- 1.Čtvrtlík, R., Kulikovsky, V., Vorlíček, V., Tomaštík, J., Drahokoupil, J., Jastrabík, L. Mechanical properties and microstructural characterization of amorphous SiCxNy thin films after annealing beyond 1100°C. Journal of the American Ceramic Society. 2016, 99(3), 996-1005. ISSN 0002-7820. E-ISSN 1551-2916. Dostupné z: https://doi.org/10.1111/jace.14057
Počet záznamů: 1