Počet záznamů: 1  

Mechanical properties and microstructural characterization of amorphous SiC.sub.x./sub.N.sub.y./sub. thin films after annealing beyond 1100°C

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    0470522 - FZÚ 2017 RIV US eng J - Článek v odborném periodiku
    Čtvrtlík, R. - Kulikovsky, V. - Vorlíček, Vladimír - Tomaštík, J. - Drahokoupil, Jan - Jastrabík, L.
    Mechanical properties and microstructural characterization of amorphous SiCxNy thin films after annealing beyond 1100°C.
    Journal of the American Ceramic Society. Roč. 99, č. 3 (2016), 996-1005. ISSN 0002-7820. E-ISSN 1551-2916
    Institucionální podpora: RVO:68378271
    Klíčová slova: SiCxNy thin films * reactive DC magnetron sputtering * annealing * XRD and Raman spectroscopy
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
    Impakt faktor: 2.841, rok: 2016

    The effect of thermal annealing on structure and mechanical properties of amorphous SiCxNy (y ≥ 0) thin films was investigated up to 1500°C in air and Ar. The SiCxNy films (2.2–3.4 μm) were deposited by reactive DC magnetron sputtering on Si, Al2O3 and α-SiC substrates without intentional heating and at 600°C. The SiC target with small excess of carbon was sputtered at various N2/Ar gas flow ratios (0–0.48). The nitrogen content in the films changes in the range 0–43 at.%. Hardness and elastic modulus (nanoindentation), change in film thickness, film composition, and structure (Raman spectroscopy, XRD) were investigated in dependence on annealing temperature and nitrogen content.All SiCxNy films preserve their amorphous structure up to 1500°C.The hardness of all as-deposited and both air- and Ar-annealed SiCxNy films decreases with growth of nitrogen content.
    Trvalý link: http://hdl.handle.net/11104/0269721

     
     
Počet záznamů: 1  

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