Vaněk, J. - Čech, V. - Přikryl, R. - Zemek, Josef - Peřina, Vratislav
Basic characteristics of the a-SiOC:H thin films prepared by PE CVD.
Czechoslovak Journal of Physics. Roč. 54, č. 9 (2004), C937-942. ISSN 0011-4626.
[Proceedings of the Symposium on Plasma and Technology /21./. Praha, 14.06.2004-17.06.2004]
Grant CEP: GA AV ČR KSK1010104
Impakt faktor: 0.292, rok: 2004
http://hdl.handle.net/11104/0000168