Počet záznamů: 1
XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films
- 1.Zemek, J., Jiříček, P. XPS and He II photoelectron yield study of the activation process in Ti-Zr NEG films. Vacuum. 2003, 71(-), 329-333. ISSN 0042-207X. E-ISSN 1879-2715.
Počet záznamů: 1