0617414 - ÚPT 2025 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Šilhan, Lukáš - Novotný, Jan - Plichta, Tomáš - Ježek, Jan - Vaculík, Ondřej - Šerý, Mojmír
Design of Setup for Laser Induced Plasma Etching.
International Vacuum Nanoelectronics Conference. In: 2024 37th International Vacuum Nanoelectronics Conference, IVNC 2024. New York: IEEE, 2024, s. 44-45. ISBN 979-8-3503-7977-8. ISSN 2164-2370.
[International Vacuum Nanoelectronics Conference (IVNC) /37./. Brno (CZ), 15.07.2024-19.07.2024]
Grant CEP: GA TA ČR(CZ) TN02000020
Institucionální podpora: RVO:68081731
Klíčová slova: vacuum chamber * plasma etching * femtosecond laser * micromachining * three-dimensional displays * lithography * electronics industry * surface emitting lasers * ignition
Obor OECD: Optics (including laser optics and quantum optics)
Web výsledku:
https://ieeexplore.ieee.org/document/10652276DOI: https://doi.org/10.1109/IVNC63480.2024.10652276

Plasma etching introduces a physically activated chemical process highly utilized in the semiconductor industry. However, for the creation of etched structures mask has to be prepared on top of the etched surfaces. This is usually achieved by electron beam lithography, which adds to the complexity and financial demands of the overall process. We present the design of a setup for maskless plasma etching, which utilizes a tightly focused ultrashort laser pulse for the ignition of etching plasma in a custom vacuum chamber with a connection to a gas-containing etching species. In addition, etched structures are written into the surface of sample by scanning with the vacuum chamber with relation to fixed laser focus. This enables maskless 3D etching of samples with a less complicated technological process.
Trvalý link: https://hdl.handle.net/11104/0364348