Chem-mechanical polishing influenced morphology, spectral and electrochemical characteristics of boron doped diamond

0570739 - FZÚ 2024 RIV US eng J - Článek v odborném periodiku
Zelenský, M. - Fischer, J. - Baluchová, S. - Klimša, Ladislav - Kopeček, Jaromír - Vondráček, Martin - Fekete, Ladislav - Eidenschink, J. - Matysik, F. M. - Mandal, S. - Williams, O.A. - Hromadová, Magdaléna - Mortet, Vincent - Schwarzová-Pecková, K. - Taylor, Andrew
Chem-mechanical polishing influenced morphology, spectral and electrochemical characteristics of boron doped diamond.
Carbon. Roč. 203, Jan (2023), s. 363-376. ISSN 0008-6223. E-ISSN 1873-3891
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR(CZ) GA20-03187S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Výzkumná infrastruktura: CzechNanoLab - 90110; CzechNanoLab II - 90251
Institucionální podpora: RVO:68378271 ; RVO:61388955
Klíčová slova: boron doped diamond electrode * boron content * chem-mechanical polishing * heterogenous electron transfer kinetics * morphology * surface characterization
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.); Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis) (UFCH-W)
Impakt faktor: 10.9, rok: 2022
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.carbon.2022.11.069

In this study complex characterization and comparison of as-grown and chemical-mechanical (CM) polished ultra-thin (≤500 nm) boron doped diamond (BDD) electrodes with various boron content (0.58–4.4 × 1021 cm−3, deposited with B/C 500–8000 ppm) was performed. Atomic force and scanning electron microscopy were used to compare morphological changes and confirm the reduction in roughness down to ≤2 nm. High-quality CM polishing enabled electron backscatter diffraction leading to the evaluation of grain size distribution (mean 0.3 μm) and preferred grain texture, {011}. X-ray photoelectron spectroscopy confirmed an increase in the B content on the surface of CM polished electrodes as a result of exposure of boron atoms incorporated into the bulk for highly doped BDD4000 and BDD8000 electrodes. Additionally, CM polished BDD electrodes are shown to possess uniform distribution of conductivity as proved by scanning electrochemical microscopy.
Trvalý link: https://hdl.handle.net/11104/0342104