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Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold

  1. 1. 0489644 - UFP-V 2019 RIV DK eng J - Článek v odborném periodiku
    Makhotkin, I.A. - Sobierajski, R. - Chalupský, J. - Tiedtke, K. - de Vries, G. - Stoermer, M. - Scholze, F. - Siewert, F. - van de Kruijs, R.W.E. - Louis, E. - Jacyna, I. - Jurek, M. - Klinger, D. - Nittler, L. - Syryanyy, Y. - Juha, Libor - Hájková, V. - Vozda, V. - Burian, Tomáš - Saksl, K. - Faatz, B. - Keitel, B. - Ploenjes, E. - Schreiber, S. - Toleikis, S. - Loch, R. - Hermann, M. - Strobel, S. - Nienhuys, H.-K. - Gwalt, G. - Mey, T. - Enkisch, H.
    Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
    Journal of Synchrotron Radiation. Roč. 25, č. 1 (2018), s. 77-84. ISSN 0909-0495.
    [Workshop on FEL Photon Diagnostics, Instrumentation and Beamline Design (PhotonDiag2017). Stanford, 01.05.2017-03.05.2017]
    Grant CEP: GA ČR(CZ) GA14-29772S; GA MŠk LG15013
    Institucionální podpora: RVO:61389021
    Klíčová slova: free-electron laser induced damage * EUV optics * thin films * FELs
    Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
    Obor OECD: Fluids and plasma physics (including surface physics)

    The durability of grazing-and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20 degrees and 10 degrees grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16 degrees off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface.
    Trvalý link: http://hdl.handle.net/11104/0284055