0134653 - FZU-D 20030553 RIV NL eng J - Článek v odborném periodiku
Vlček, J. - Kormunda, M. - Čízek, J. - Peřina, Vratislav - Zemek, Josef
Influence of nitrogen-argon gas mixtures on reactive magnetron sputtering of hard Si-C-N films.
Surface and Coatings Technology. Roč. 160, - (2002), s. 74-81. ISSN 0257-8972. E-ISSN 1879-3347
Grant CEP: GA MŠMT ME 203
Výzkumný záměr: CEZ:AV0Z1010914; CEZ:MSM 235200002; CEZ:AV0Z1048901
Klíčová slova: silicon-carbon-nitride films * magnetron co-sputtering * mass spectroscopy * elemental composition * surface bonding structure * hardness
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.267, rok: 2002

It was shown that the nitrogen-argon gas mixture composition is an important process parameter in a reproducible production of Si-C-N compounds with controlled properties by dc magnetron co-sputtering using a composed C-Si target with variable Si/C area ratios.
Trvalý link: http://hdl.handle.net/11104/0032547