Preparation of silicon nanoaggregates by thermal activated reaction

0134297 - FZU-D 20030193 RIV NL eng J - Článek v odborném periodiku
Blondeau, J.P. - Allam, L. - Fleury, V. - Simon, P. - Gregora, Ivan
Preparation of silicon nanoaggregates by thermal activated reaction.
Materials Science and Engineering B-Advanced Functional Solid-State Materials. Roč. 100, - (2003), s. 27-34. ISSN 0921-5107. E-ISSN 1873-4944
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: nanocrystalline silicon * fractals * Raman scattering
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

In the context of silicon nanoaggregates elaboration, we study Al-SiO₂ interface at temperatures under or above the eutectic point. The broadening and the silicon Raman line allow to estimate the size of the silicon nanocrystals and to conclude to nanometer size.
Trvalý link: http://hdl.handle.net/11104/0032207