0133418 - FZU-D 20010269 RIV FR eng J - Článek v odborném periodiku
Popov, C. - Bulíř, Jiří - Zambov, L. M. - Delplancke-Ogletree, M. P. - Kulisch, W.
Comparative characterization of nitrogen-rich CN_x films prepared by different ICP-CVD techniques.
Journal de Physique IV. Roč. 11, - (2001), s. 731-738. ISSN 1155-4339
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: nitrogen rich CN_xfilms * ICP/CVP
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 0.401, rok: 2001

Thin amorphous nitrogen-rich CN_{x films (N/(C+N)ň0.5) have been prepared by two inductively coupled plasma chemical vapour deposition (ICP/CVP) techniques:using transport reactions from a solid carbon source and from CCl}4/NH_{3/Ar and CCl}4/N_2/H2/Ar gas mixtures. The result of both deposition methods were compared and discussed on the base of the specificities ot the processes.
Trvalý link: http://hdl.handle.net/11104/0031387