0133319 - FZU-D 20010114 RIV CZ eng J - Článek v odborném periodiku
Maček, M. - Čekada, M. - Panjan, P. - Mišina, Martin
Effect of reactive gas pressure on the plasma parameters during triode ion plating of Cr-C films.
Czechoslovak Journal of Physics. Roč. 50, Suppl. S3 (2000), s. 403-408. ISSN 0011-4626.
[Symposium on Plasma Physics and Technology /19./. Praha, 06.06.2000-09.06.2000]
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: Cr-C films * partial presser of the reactive gas * triode ion plating
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 0.298, rok: 2000

Mechanical properties and the average chemical composition of Cr-C hard coatings deposited by means of triode ion plating strongly depends on the partial pressure of the reactive gas (C2H2) during the deposition.
Trvalý link: http://hdl.handle.net/11104/0000612