0132755 - FZU-D 20000007 RIV DE eng J - Článek v odborném periodiku
Rezek, Bohuslav - Stuchlík, Jiří - Fejfar, Antonín - Kočka, Jan - Nebel, C. E. - Stutzmann, M.
Characterization of laser pattern a-Si:H thin films by combined AFM/Local Current Measurements.
Physica Status Solidi A. Roč. 170, č. 1 (1998), s. R1-R2. ISSN 0031-8965
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 0.782, rok: 1998

Laser interference crystallization of amorphous hydrogenated silicon, followed by selective plasma-enhanced deposition and etching can be used for new large area microelectronic applications.
Trvalý link: http://hdl.handle.net/11104/0030757