Počet záznamů: 1

Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

  1. 1.
    0367262 - FZU-D 2012 RIV CH eng J - Článek v odborném periodiku
    Straňák, V. - Block, S. - Drache, S. - Hubička, Zdeněk - Helm, Ch.A. - Jastrabík, Lubomír - Tichý, M. - Hippler, R.
    Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system.
    Surface and Coatings Technology. Roč. 205, 8-9 (2011), s. 2755-2762 ISSN 0257-8972
    Grant CEP: GA AV ČR KAN301370701; GA AV ČR KJB100100805; GA MŠk(CZ) 1M06002
    Grant ostatní: AVČR(CZ) M100100915
    Výzkumný záměr: CEZ:AV0Z10100522
    Klíčová slova: Cu cluster growth * pulsed magnetron sputtering * cluster mass- and size- distribution * AFM
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
    Impakt faktor: 1.867, rok: 2011

    Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1–25 kHz) and the duty cycles (20–90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100–800 mA) and the pressure in the condensation tube (25–90 Pa) is also investigated. For all preparation conditions, the cluster mass shows a lognormal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 105amu, or cluster diameter 8–10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critical buffer gas temperature Tg-cr which limits cluster growth.
    Trvalý link: http://hdl.handle.net/11104/0202005