Počet záznamů: 1

Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

  1. 1.
    0359322 - FZU-D 2012 RIV US eng J - Článek v odborném periodiku
    Sobierajski, R. - Bruijn, S. - Khorsand, A.R. - Louis, E. - van de Kruijs, R.W.E. - Burian, Tomáš - Chalupský, Jaromír - Cihelka, Jaroslav - Gleeson, A. - Grzonka, J. - Gullikson, E.M. - Hájková, Věra - Hau-Riege, S. - Juha, Libor - Jurek, M. - Klinger, D. - Krzywinski, J. - London, R. - Pelka, J. B. - Płociński, T. - Rasiński, M. - Tiedtke, K. - Toleikis, S. - Vyšín, Luděk - Wabnitz, H. - Bijkerk, F.
    Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources.
    Optics Express. Roč. 19, č. 1 (2011), s. 193-205 ISSN 1094-4087
    Grant CEP: GA AV ČR KAN300100801; GA MŠk LC510; GA MŠk(CZ) LC528; GA MŠk LA08024; GA AV ČR IAA400100701
    Výzkumný záměr: CEZ:AV0Z10100523
    Klíčová slova: laser damage * thermal effects * multilayers * optical design and fabrication * free-electron lasers
    Kód oboru RIV: BH - Optika, masery a lasery
    Impakt faktor: 3.587, rok: 2011

    We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg - FLASH. The damage was studied "post-mortem" by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo2N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N-2, leading to bubbles inside the multilayer structure.
    Trvalý link: http://hdl.handle.net/11104/0197124