Počet záznamů: 1
Study of Cu+, Ag+ and Au+ ion implantation into silicate glasses
- 1.0351912 - ÚJF 2011 RIV NL eng J - Článek v odborném periodiku
Švecová, B. - Nekvindová, P. - Macková, Anna - Malinský, Petr - Kolitsch, A. - Machovič, V. - Stara, S. - Míka, M. - Špirková, J.
Study of Cu+, Ag+ and Au+ ion implantation into silicate glasses.
Journal of Non-Crystalline Solids. Roč. 356, 44-49 (2010), s. 2468-2472. ISSN 0022-3093. E-ISSN 1873-4812.
[XII International Conference on the Physics of Non-Crystalline Solids. Foz do Iguaçu, PR, Brazil, 06.09.-09.09.2009]
Grant CEP: GA MŠMT(CZ) LC06041; GA ČR GA106/09/0125
Výzkumný záměr: CEZ:AV0Z10480505
Klíčová slova: Ion implantation * Silicate glasses * Metal nanoparticles * RBS
Kód oboru RIV: BG - Jaderná, atomová a mol. fyzika, urychlovače
Impakt faktor: 1.483, rok: 2010
A study of the ion implantation of Cu+, Ag+ or Au+ ions into different types of silicate glasses is reported. The energy of the implanted ions was 330 keV and the implantation fluence was kept at 11016 cm-2. The samples were characterised by various analytical methods: Rutherford Backscattering Spectrometry for the concentration depth profiles of the implanted atoms, Raman spectroscopy for the structure of the samples and also by UV-VIS absorption spectroscopy. The obtained data were evaluated on the bases of the structure of the glass matrix and the relations between the structural changes and optical properties, important for photonics applications, were formulated. The main focus was the impact of various types and concentrations of glass network modifiers (e.g. Li, Na, K, Mg, Ca or Zn) as well as glass network formers (Si, B) on the projected range of the implanted ions.
Trvalý link: http://hdl.handle.net/11104/0191547
Počet záznamů: 1