Počet záznamů: 1

Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses

  1. 1.
    0350278 - FZU-D 2011 RIV GB eng J - Článek v odborném periodiku
    Mocek, Tomáš - Jakubczak, Krzysztof - Kozlová, Michaela - Polan, Jiří - Homer, Pavel - Hřebíček, J. - Sawicka, Magdalena - Kim, I. J. - Park, S.B. - Kim, C. M. - Lee, G.H. - Kim, T.K. - Nam, C. H. - Chalupský, Jaromír - Hájková, Věra - Juha, Libor - Sobota, Jaroslav - Fořt, Tomáš - Rus, Bedřich
    Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses.
    Radiation Effects and Defects in Solids. Roč. 165, 6-10 (2010), s. 551-558 ISSN 1042-0150
    Grant CEP: GA AV ČR KAN300100702; GA MŠk(CZ) LC528; GA MŠk LA08024; GA ČR GC202/07/J008
    Výzkumný záměr: CEZ:AV0Z10100523; CEZ:AV0Z20650511
    Klíčová slova: XUV lasers * ablation * microstructuring * laser-induced periodic surface structures
    Kód oboru RIV: BH - Optika, masery a lasery
    Impakt faktor: 0.660, rok: 2010

    We report on a single-shot micropatterning of an organic polymer achieved by ablation with demagnifying projection using a plasma-based extreme ultraviolet (XUV) laser at 21 nm. A nickel mesh with a period of 100μm was 10 × demagnified and imprinted on poly(methyl methacrylate) (PMMA) via direct ablation. This first demonstration of single-shot projection, single-step lithography illustrates the great potential of XUV lasers for the direct patterning of materials with a resolution scalable down to the submicrometer domain. In the second part, we present a novel experimental method for improving the efficiency of surface processing of various solids achieved by simultaneous action of XUV.
    Trvalý link: http://hdl.handle.net/11104/0190317