Počet záznamů: 1

Properties of Au nanolayers on polyethyleneterephthalate and polytetrafluoroethylene

  1. 1.
    0332312 - UJF-V 2010 RIV GB eng J - Článek v odborném periodiku
    Slepička, P. - Kolská, Z. - Náhlík, J. - Hnatowicz, Vladimír - Švorčík, V.
    Properties of Au nanolayers on polyethyleneterephthalate and polytetrafluoroethylene.
    [Vlastnosti nanovrstev Au na polyethylentereftalate a polytetrafluorethylene.]
    Surface and Interface Analysis. Roč. 41, č. 9 (2009), s. 741-745 ISSN 0142-2421
    Grant CEP: GA MŠk(CZ) LC06041; GA ČR GA106/09/0125
    Výzkumný záměr: CEZ:AV0Z10480505
    Klíčová slova: polymer * plasma treatment * Au nanolayer
    Kód oboru RIV: BG - Jaderná, atomová a mol. fyzika, urychlovače
    Impakt faktor: 0.998, rok: 2009

    Gold nanolayers deposited by sputtering on polytetrafluoroethylene (PTFE) and polyethyleneterephthalate (PET) films were studied in this work. The influence of sputtering time on the layer thickness, surface morphology and roughness was determined by various methods (i.e. atomic absorption spectroscopy, focused ion beam and scanning electron microscopy). Sheet resistance and concentration and mobility of free charge carriers in Au nanolayers were determined using the Van der Pauw method. Surface morphology was determined using atomic force microscopy (AFM). After gold deposition on PET, the surface roughness increases and the surface morphology changes in contrast with PTFE coated under the same conditions. With the increasing sputtering time,the layer resistance decreases rapidly for both polymer substrates. Electrically continuous coverage is achieved for the gold layer with an average thickness of ca 4 nm for PET and ca 5 nm for PTFE.

    Nanovrstvy Au na naprášené na polyethylentereftalatu a polytetrafluorethylenu byly studovány různými metodami a jejich tlouštka, morfologie a elektrická vodivost byly stanoveny v závislosti ns deposiční době. Elektrická vodivost roste s rostoucí tlouštkou vrstvy a souvislá vrstva Au vzniká při středních tlouštkách 4-5nm.
    Trvalý link: http://hdl.handle.net/11104/0177607