Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H.sub.2./sub.S gas mixture

0533973 - FZÚ 2021 RIV CH eng J - Článek v odborném periodiku
Hubička, Zdeněk - Čada, Martin - Kapran, Anna - Olejníček, Jiří - Kšírová, Petra - Zanáška, Michal - Adámek, Petr - Tichý, M.
Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H₂S gas mixture.
Coatings. Roč. 10, č. 3 (2020), s. 1-17, č. článku 246. E-ISSN 2079-6412
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR GA19-00579S; GA MPO FV20580
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: HiPIMS * Langmuir probe * optical emission spectrometry * time-resolved probe measurements * H₂S * electron density * electron temperature
Obor OECD: Coating and films
Impakt faktor: 2.881, rok: 2020
Způsob publikování: Open access

A reactive high-power impulse magnetron sputtering system (HiPIMS) working in Ar + H2S gas mixture was investigated as a source for the deposition of iron sulfide thin films. As a sputtering material, a pure Fe target was used. Plasma parameters in this system were investigated by a time-resolved Langmuir probe, radio-frequency (RF) ion flux probe, quartz crystal monitor modified for measurement of the ionized fraction of depositing particles, and by optical emission spectroscopy.
Trvalý link: http://hdl.handle.net/11104/0312196