Výsledky vyhledávání
- 1.0514120 - ÚPT 2020 JO eng A - Abstrakt
Mousa, M. S. - Chlumská, Jana - Knápek, Alexandr
Similarities and Differences between two researches in Field Electron Emission: Way to develop more powerful electron source.
Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
[The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
Institucionální podpora: RVO:68081731
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
Trvalý link: http://hdl.handle.net/11104/0302366 - 2.0512152 - ÚPT 2020 JO eng A - Abstrakt
Mousa, M. S. - Al-Soud, A. - Knápek, Alexandr
Analysis of the various effects of coating W tips with dielectric Epoxylite 478 and EPR 4 resin coatings under similar operational conditions.
Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
[The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
Institucionální podpora: RVO:68081731
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
Trvalý link: http://hdl.handle.net/11104/0302364 - 3.0512151 - ÚPT 2020 JO eng A - Abstrakt
Matějka, Milan - Chlumská, Jana - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
Fabrication of functional nanostructures in thin silicon nitride membranes.
Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
[The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
Institucionální podpora: RVO:68081731
Klíčová slova: thin dielectric layers * silicon nitride * membranes * electron beam lithography
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
Trvalý link: http://hdl.handle.net/11104/0302363 - 4.0512149 - ÚPT 2020 JO eng A - Abstrakt
Knápek, Alexandr - Drozd, Michal - Matějka, Milan - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír
Automated system for optical inspection of defects in resist coated non-patterned wafer.
Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
[The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
Grant CEP: GA MPO FV10618
Institucionální podpora: RVO:68081731
Klíčová slova: dielectric surface inspection * resist coated wafer
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
Trvalý link: http://hdl.handle.net/11104/0302361 - 5.0512148 JO BXXS
Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts.
Amman: Jordan University of Science & Technology, 2019