Výsledky vyhledávání

  1. 1.
    0514120 - ÚPT 2020 JO eng A - Abstrakt
    Mousa, M. S. - Chlumská, Jana - Knápek, Alexandr
    Similarities and Differences between two researches in Field Electron Emission: Way to develop more powerful electron source.
    Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
    [The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
    Institucionální podpora: RVO:68081731
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0302366
     
     
  2. 2.
    0512152 - ÚPT 2020 JO eng A - Abstrakt
    Mousa, M. S. - Al-Soud, A. - Knápek, Alexandr
    Analysis of the various effects of coating W tips with dielectric Epoxylite 478 and EPR 4 resin coatings under similar operational conditions.
    Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
    [The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
    Institucionální podpora: RVO:68081731
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0302364
     
     
  3. 3.
    0512151 - ÚPT 2020 JO eng A - Abstrakt
    Matějka, Milan - Chlumská, Jana - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
    Fabrication of functional nanostructures in thin silicon nitride membranes.
    Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
    [The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
    Institucionální podpora: RVO:68081731
    Klíčová slova: thin dielectric layers * silicon nitride * membranes * electron beam lithography
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0302363
     
     
  4. 4.
    0512149 - ÚPT 2020 JO eng A - Abstrakt
    Knápek, Alexandr - Drozd, Michal - Matějka, Milan - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír
    Automated system for optical inspection of defects in resist coated non-patterned wafer.
    Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
    [The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
    Grant CEP: GA MPO FV10618
    Institucionální podpora: RVO:68081731
    Klíčová slova: dielectric surface inspection * resist coated wafer
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0302361