Výsledky vyhledávání

  1. 1.
    0514120 - ÚPT 2020 JO eng A - Abstrakt
    Mousa, M.S. - Chlumská, Jana - Knápek, Alexandr
    Similarities and Differences between two researches in Field Electron Emission: Way to develop more powerful electron source.
    Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
    [The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
    Institucionální podpora: RVO:68081731
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0302366
     
  2. 2.
    0512151 - ÚPT 2020 JO eng A - Abstrakt
    Matějka, Milan - Chlumská, Jana - Krátký, Stanislav - Řiháček, Tomáš - Knápek, Alexandr - Kolařík, Vladimír
    Fabrication of functional nanostructures in thin silicon nitride membranes.
    Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
    [The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
    Institucionální podpora: RVO:68081731
    Klíčová slova: thin dielectric layers * silicon nitride * membranes * electron beam lithography
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0302363
     
  3. 3.
    0512149 - ÚPT 2020 JO eng A - Abstrakt
    Knápek, Alexandr - Drozd, Michal - Matějka, Milan - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír
    Automated system for optical inspection of defects in resist coated non-patterned wafer.
    Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). Book of Abstracts. Amman: Jordan University of Science & Technology, 2019.
    [The Fourth International Symposium on Dielectric Materials and Applications (ISyDMA 4). 02.05.2019-04.05.2019, Amman]
    Grant CEP: GA MPO FV10618
    Institucionální podpora: RVO:68081731
    Klíčová slova: dielectric surface inspection * resist coated wafer
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0302361
     
  4. 4.
    0511777 - ÚPT 2020 eng A - Abstrakt
    Knápek, Alexandr - Drozd, Michal - Matějka, Milan - Chlumská, Jana - Král, Stanislav - Kolařík, Vladimír
    Automated inspection of PMMA coating on non-patterned silicon wafers.
    11th International Conference on Instrumental Methods of Analysis: Modern Trends and Applications, IMA-2019. Book of abstracts. -: -, 2019. s. 162.
    [International Conference on Instrumental Methods of Analysis: Modern Trends and Applications /11./. 22.09.2019-25.09.2019, Ioannina]
    Grant CEP: GA MPO FV10618
    Institucionální podpora: RVO:68081731
    Klíčová slova: dielectric surface inspection * resist coated wafer
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Obor OECD: Nano-processes (applications on nano-scale)
    Trvalý link: http://hdl.handle.net/11104/0302052
     
  5. 5.
    0429465 - ÚPT 2015 GB eng A - Abstrakt
    Krátký, Stanislav - Kolařík, Vladimír - Urbánek, Michal - Matějka, Milan - Horáček, Miroslav - Chlumská, Jana - Neděla, Vilém - Jaffrezic-Renault, N. - Krejčí, J. - Kučerová, R. - Plička, R. - Krejčí, T.
    Differential conductometry biosensors prepared by lift-off technique by using of e-beam writer with shaped beam.
    39th International Conference on Micro and Nano Engineering MNE2013. Book of Abstracts. Cambridge: University of Cambridge, 2013. s. 387.
    [MNE2013. International Conference on Micro and Nano Engineering /39./. 16.09.2013-19.09.2013, London]
    Institucionální podpora: RVO:68081731
    Klíčová slova: differential conductometry biosensor * electron-beam lithography * microorganism detection
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0234577
     
  6. 6.
    0429463 - ÚPT 2015 GB eng A - Abstrakt
    Urbánek, Michal - Matějka, Milan - Kolařík, Vladimír - Horáček, Miroslav - Krátký, Stanislav - Bok, Jan - Chlumská, Jana - Mikšík, P. - Vašina, J.
    Variable shape E-beam writing: proximity effect simulation and correction of binary and relief structures.
    39th International Conference on Micro and Nano Engineering MNE2013. Book of Abstracts. Cambridge: University of Cambridge, 2013. s. 582.
    [MNE2013. International Conference on Micro and Nano Engineering /39./. 16.09.2013-19.09.2013, London]
    Institucionální podpora: RVO:68081731
    Klíčová slova: rectangular shaped beam * proximity effect simulation * binary structures and relief structures
    Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
    Trvalý link: http://hdl.handle.net/11104/0234576