Výsledky vyhledávání
- 1.0585551 - FZÚ DATA Vědecká data 2024
Irimiciuc, Stefan - Grumezescu, V. - Holban, A. M. - Gherasim, O. - Chertopalov, Sergii - Garoi, P. - Craciun, V. - Lančok, Ján
Dataset for Silver oxide phase tailoring for improved antimicrobial activity.
Popis: This data sheets contain This dataset contains data from morphological and structural analysis of pulsed laser deposited silver oxide thin films and their antibacterial behavior.
File 1. Scanning electron microscopy images of AgxO films produced by pulsed laser deposition deposited in O2 at 0.01 Pa (a), 0.1 Pa(b) and 1 Pa (c). The images were recorded using a magnification of 100 000 x.
File 2. Optical transmission spectra in the 300-800 nm range of the AgxO films containing different oxide phases (a) and the corresponding Tauc plots (b) recalculated using the Tauc plot method
File 3. X-ray diffraction patterns in the 20 -80 degrees range for the AgxO films deposited in 0.01, 0.1 and 1 Pa or O2 and the Photoelectron spectra recorded form the AgxO multiphase films as follows: in the 364-378 eV for the Ag3d peak and the 525-535 eV for the O1s peak.
File 4. Antibacterial activity of the AgxO films after 4 (a) and 24 hours (b) which depicts the evolution of Staphylococcus aureus and Escherichia coli bacteria population on the silver oxide films after the samples were intubated at 37 degrees for the two times that they were investigated.
Klíčová slova: antimicrobial activity * silver oxide phase tailoring * pulsed laser deposition * x ray diffraction pattern
Obor OECD: Materials engineering
DOI: https://doi.org/10.57680/asep.0585551
Handle: https://hdl.handle.net/11104/0353279
Vkladatel: admin
Datum publikování: 30.4.2024
Licence: CC BY 4.0 - Uveďte původ Mezinárodní licence
Název souboru Staženo Velikost Komentář Přístup data for Silver oxide phase tailoring for improved antimicrobial activity.zip Přehled souborů 2 16.5 MB vyžádat Grant CEP: GA MŠMT(CZ) EH22_008/0004596
Institucionální podpora: RVO:68378271 - 2.0538597 - ÚFP 2021 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Frolov, Oleksandr - Koláček, Karel - Schmidt, Jiří - Štraus, Jaroslav - Choukourov, A.
Nanostructuring of PMMA, GaAs, SiC and Si samples by focused XUV laser beam.
Optics Damage and Materials Processing by EUV/X-ray Radiation VII. Bellingham: SPIE, 2019 - (Juha, L.; Bajt, S.; Guizard, S.), Roč. 11035 (2019), č. článku 110350K. Proceedings of SPIE, 11035. ISBN 978-151062736-9. ISSN 0277-786X.
[Conference on Optics Damage and Materials Processing by EUV/X-Ray Radiation VII. Praha (CZ), 01.04.2019-03.04.2019]
Grant CEP: GA MŠMT LTT17015
Institucionální podpora: RVO:61389021
Klíčová slova: Ablation * Diffraction pattern * Nanopatterning * Nanostructuring * XUV laser
Obor OECD: Optics (including laser optics and quantum optics)
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11035/110350K/Nanostructuring-of-PMMA-GaAs-SiC-and-Si-samples-by-focused/10.1117/12.2521444.short?SSO=1
Trvalý link: http://hdl.handle.net/11104/0316374 - 3.0453284 - ÚFP 2016 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Schmidt, Jiří - Štraus, Jaroslav - Koláček, Karel - Frolov, Oleksandr
Nanostructuring of solid surfaces by discharge-pumped xuv laser source.
NANOCON 2015: 7th International Conference, Papers - Full Texts. Ostrava: TANGER, spol. s r.o, 2015 - (Shrbená, J.; Zbořil, R.). ISBN 978-80-87294-59-8.
[NANOCON 2015. International Conference /7./. Brno (CZ), 14.10.2015-16.10.2015]
Grant CEP: GA MŠMT(CZ) LG13029; GA ČR(CZ) GA14-29772S
Institucionální podpora: RVO:61389021
Klíčová slova: XUV laser * laser ablation * diffraction pattern
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Trvalý link: http://hdl.handle.net/11104/0254112 - 4.0386542 - ÚFP 2013 US eng A - Abstrakt
Koláček, Karel - Štraus, Jaroslav - Schmidt, Jiří - Frolov, Oleksandr - Prukner, Václav - Melich, Radek - Choukourov, A. - Sobota, Jaroslav - Fořt, Tomáš
Direct nano-structuring of solid surface by extreme ultraviolet Ar8+ laser (poster P06.6).
The 56th International Conference on Electron, Ion and Photon Beam Technology & Nanofabrication, Program Guide. Waikoloa, Hawaii: IEEE, 2012. s. 24-24. ISBN N.
[International Conference on Electron, Ion and Photon Beam Technology & Nanofabrication/56./. 29.05.2012-01.06.2012, Waikoloa, Hawaii]
Grant CEP: GA MŠMT LA08024
Výzkumný záměr: CEZ:AV0Z20430508
Institucionální podpora: RVO:68081731
Klíčová slova: nano-patterning by Ar8+ laser * ablation * desorption * direct engraving of 2D diffraction pattern
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech; JA - Elektronika a optoelektronika, elektrotechnika (UPT-D)
Trvalý link: http://hdl.handle.net/11104/0220188 - 5.0352880 - ÚFP 2011 RIV CZ eng O - Ostatní výsledky
Koláček, Karel - Štraus, Jaroslav - Schmidt, Jiří - Frolov, Oleksandr - Prukner, Václav - Sobota, Jaroslav - Fořt, Tomáš - Shukurov, A.
Our first step to direct writing XUV lithography(SPPT 24th.,2010).
2010
Grant CEP: GA MŠMT LA08024; GA MŠMT(CZ) LC528; GA AV ČR KAN300100702
Výzkumný záměr: CEZ:AV0Z20430508; CEZ:AV0Z20650511
Klíčová slova: nanopatterning by Ar8+ laser * laser induced periodic surface structure * ablation of 2D diffraction pattern
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Trvalý link: http://hdl.handle.net/11104/0192274