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0489644 - ÚFP 2019 RIV DK eng J - Článek v odborném periodiku
Makhotkin, I.A. - Sobierajski, R. - Chalupský, J. - Tiedtke, K. - de Vries, G. - Stoermer, M. - Scholze, F. - Siewert, F. - van de Kruijs, R.W.E. - Louis, E. - Jacyna, I. - Jurek, M. - Klinger, D. - Nittler, L. - Syryanyy, Y. - Juha, Libor - Hájková, V. - Vozda, V. - Burian, Tomáš - Saksl, K. - Faatz, B. - Keitel, B. - Ploenjes, E. - Schreiber, S. - Toleikis, S. - Loch, R. - Hermann, M. - Strobel, S. - Nienhuys, H.-K. - Gwalt, G. - Mey, T. - Enkisch, H.
Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
Journal of Synchrotron Radiation. Roč. 25, č. 1 (2018), s. 77-84. ISSN 0909-0495. E-ISSN 1600-5775.
[Workshop on FEL Photon Diagnostics, Instrumentation and Beamline Design (PhotonDiag2017). Stanford, 01.05.2017-03.05.2017]
Grant CEP: GA ČR(CZ) GA14-29772S; GA MŠMT LG15013
Institucionální podpora: RVO:61389021
Klíčová slova: free-electron laser induced damage * EUV optics * thin films * FELs
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 2.452, rok: 2018
Trvalý link: http://hdl.handle.net/11104/0284055
Makhotkin, I.A. - Sobierajski, R. - Chalupský, J. - Tiedtke, K. - de Vries, G. - Stoermer, M. - Scholze, F. - Siewert, F. - van de Kruijs, R.W.E. - Louis, E. - Jacyna, I. - Jurek, M. - Klinger, D. - Nittler, L. - Syryanyy, Y. - Juha, Libor - Hájková, V. - Vozda, V. - Burian, Tomáš - Saksl, K. - Faatz, B. - Keitel, B. - Ploenjes, E. - Schreiber, S. - Toleikis, S. - Loch, R. - Hermann, M. - Strobel, S. - Nienhuys, H.-K. - Gwalt, G. - Mey, T. - Enkisch, H.
Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
Journal of Synchrotron Radiation. Roč. 25, č. 1 (2018), s. 77-84. ISSN 0909-0495. E-ISSN 1600-5775.
[Workshop on FEL Photon Diagnostics, Instrumentation and Beamline Design (PhotonDiag2017). Stanford, 01.05.2017-03.05.2017]
Grant CEP: GA ČR(CZ) GA14-29772S; GA MŠMT LG15013
Institucionální podpora: RVO:61389021
Klíčová slova: free-electron laser induced damage * EUV optics * thin films * FELs
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 2.452, rok: 2018
Trvalý link: http://hdl.handle.net/11104/0284055