0617414 - ÚPT 2025 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Šilhan, Lukáš - Novotný, Jan - Plichta, Tomáš - Ježek, Jan - Vaculík, Ondřej - Šerý, Mojmír
Design of Setup for Laser Induced Plasma Etching.
International Vacuum Nanoelectronics Conference. In: 2024 37th International Vacuum Nanoelectronics Conference, IVNC 2024. New York: IEEE, 2024, s. 44-45. ISBN 979-8-3503-7977-8. ISSN 2164-2370.
[International Vacuum Nanoelectronics Conference (IVNC) /37./. Brno (CZ), 15.07.2024-19.07.2024]
Grant CEP: GA TA ČR(CZ) TN02000020
Institucionální podpora: RVO:68081731
Klíčová slova: vacuum chamber * plasma etching * femtosecond laser * micromachining * three-dimensional displays * lithography * electronics industry * surface emitting lasers * ignition
Obor OECD: Optics (including laser optics and quantum optics)
Web výsledku:
https://ieeexplore.ieee.org/document/10652276DOI: https://doi.org/10.1109/IVNC63480.2024.10652276
Trvalý link: https://hdl.handle.net/11104/0364348