Košík

0570943 - FZÚ 2024 RIV US eng J - Článek v odborném periodiku
Jovanović, Z. - Trstenjak, U. - Ho, H.C. - Butsyk, Olena - Chen, B. - Tchernychova, E. - Borodavka, Fedir - Koster, G. - Hlinka, Jiří - Spreitzer, M.
Tiling the silicon for added functionality: PLD growth of highly crystalline STO and PZT on graphene oxide-buffered silicon surface.
ACS Applied Materials and Interfaces. Roč. 15, č. 4 (2023), s. 6058-6068. ISSN 1944-8244. E-ISSN 1944-8252
Grant CEP: GA ČR(CZ) GF21-20110K
Institucionální podpora: RVO:68378271
Klíčová slova: PLD deposition * rGO buffer layer * epitaxy * STO pseudo-substrate * added functionality * PZT
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 9.5, rok: 2022
Způsob publikování: Open access
Trvalý link: https://hdl.handle.net/11104/0342281