Košík

0480517 - FZÚ 2018 eng A - Abstrakt
Chang, Yu-Ying - Neykova, Neda - Stuchlík, Jiří - Purkrt, Adam - Remeš, Zdeněk
Etching processes of ZnO thin-film in hydrogen plasma.
NANOCON 2016. List of Abstracts. Ostrava: Tanger Ltd., 2016 - (Shrbená, J.). s. 82-82. ISBN 978-80-87294-68-0.
[NANOCON 2016. International Conference /8./. 19.10.2016-21.10.2016, Brno]
Grant CEP: GA ČR GC16-10429J
Grant ostatní: AV ČR(CZ) KONNECT-007
Program: Bilaterální spolupráce
Institucionální podpora: RVO:68378271
Klíčová slova: ZnO * reactive magnetron sputtering * hydrogen plasma treatment
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Trvalý link: http://hdl.handle.net/11104/0276289