Košík

0477080 - ÚPT 2018 RIV CH eng J - Článek v odborném periodiku
Schäfer, J. - Fricke, K. - Mika, Filip - Pokorná, Zuzana - Zajíčková, L. - Foest, R.
Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure.
Thin Solid Films. Roč. 630, MAY 30 (2017), s. 71-78. ISSN 0040-6090. E-ISSN 1879-2731
Grant CEP: GA MŠMT(CZ) LO1212; GA MŠMT ED0017/01/01
Institucionální podpora: RVO:68081731
Klíčová slova: plasma jet * liquid assisted plasma enhanced chemical * vapour deposition * silicon oxide
Obor OECD: Coating and films
Impakt faktor: 1.939, rok: 2017
Trvalý link: http://hdl.handle.net/11104/0273480