Košík

0518029 - FZÚ 2020 RIV GB eng J - Článek v odborném periodiku
Dinh, TH. - Medvedev, Nikita - Ishino, M. - Kitamura, T. - Hasegawa, N. - Otobe, T. - Higashiguchi, T. - Sakaue, K. - Washio, M. - Hatano, T. - Kon, A. - Kubota, Y. - Inubushi, Y. - Owada, S. - Shibuya, T. - Ziaja, B. - Nishikino, M.
Controlled strong excitation of silicon as a step towards processing materials at sub-nanometer precision.
COMMUNICATIONS PHYSICS. Roč. 2, č. 1 (2019), s. 1-9, č. článku 150. ISSN 2399-3650. E-ISSN 2399-3650
Grant CEP: GA MŠMT LTT17015
GRANT EU: European Commission(XE) 654148 - LASERLAB-EUROPE
Institucionální podpora: RVO:68378271
Klíčová slova: interaction of solid material with intense pulses * SACLA free-electron laser * nanoscale response * craters on silicon substrate * theory and experiment
Obor OECD: Optics (including laser optics and quantum optics)
Impakt faktor: 4.684, rok: 2019
Způsob publikování: Open access
Trvalý link: http://hdl.handle.net/11104/0303232