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Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering
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SYSNO ASEP 0541681 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering Tvůrce(i) Gutiérrez-Fernández, E. (ES)
Rodriguez, Álvaro (UFCH-W)
García-Gutiérrez, M. C. (ES)
Nogales, A. (ES)
Rebollar, E. (ES)
Solano, E. (ES)
Ezquerra, T. A. (ES)Číslo článku 149254 Zdroj.dok. Applied Surface Science. - : Elsevier - ISSN 0169-4332
Roč. 548, MAY 2021 (2021)Poč.str. 9 s. Jazyk dok. eng - angličtina Země vyd. NL - Nizozemsko Klíč. slova Photoinduced Resist-free Imprinting (PRI) ; Grazing Incidence Small-angle X-ray Scattering (GISAXS) ; Laser Induced Periodic Surface Structures (LIPSS) ; Fullerene (PCBM) Vědní obor RIV CF - Fyzikální chemie a teoretická chemie Obor OECD Physical chemistry Způsob publikování Omezený přístup Institucionální podpora UFCH-W - RVO:61388955 UT WOS 000624474700005 EID SCOPUS 85101331505 DOI 10.1016/j.apsusc.2021.149254 Anotace In this article we explore the potential of synchrotron Grazing Incidence Small Angle X-ray Scattering (GISAXS) to evaluate the extension of a Photoinduced Resist-free Imprinting (PRI) effect for grating-like Laser Induced Periodic Surface Structures (LIPSS) on spin-coated thin films of the fullerene derivative [6,6]-phenyl C-71-butyric acid methyl ester (PC71BM). Valuable information about the nature of both the original fullerene LIPSS and of the remaining resist-free nanostructure in terms of geometry, size distribution, lattice periodicity and degree of order can be achieved by simulations of the GISAXS patterns. One of the most interesting features provided by the GISAXS analysis is the estimation of the paracrystalline distortion factor, which can be useful to evaluate the level of order in the nanostructure. Data revealed that LIPSS in PC71BM films can be described as onedimensional paracrystalline lattices with levels of order in accordance with those typically observed in LIPSS of other materials. The PRI effect leaves a qualitatively similar nanostructure but about two times more disordered than the original LIPSS one. Our results show that GISAXS is a powerful tool to characterize Resist-free Imprinting procedures of potential relevance in nanotechnology. Pracoviště Ústav fyzikální chemie J.Heyrovského Kontakt Michaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196 Rok sběru 2022 Elektronická adresa http://hdl.handle.net/11104/0319212
Počet záznamů: 1