Počet záznamů: 1
Determination of Composition and Thickness of MnSi and MnGe Layers by EDS.
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SYSNO ASEP 0541357 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Determination of Composition and Thickness of MnSi and MnGe Layers by EDS. Tvůrce(i) Koštejn, Martin (UCHP-M) RID, SAI, ORCID
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
Jandová, Věra (UCHP-M) RID, ORCID, SAI
Novotný, F. (CZ)Číslo článku 40 Zdroj.dok. Journal of Nondestructive Evaluation. - : Springer - ISSN 0195-9298
Roč. 39, č. 2 (2020)Poč.str. 11 s. Jazyk dok. eng - angličtina Země vyd. US - Spojené státy americké Klíč. slova composition ; area density ; thickness Vědní obor RIV CF - Fyzikální chemie a teoretická chemie Obor OECD Physical chemistry CEP GA18-15613S GA ČR - Grantová agentura ČR Způsob publikování Open access s časovým embargem (20.05.2021) Institucionální podpora UCHP-M - RVO:67985858 UT WOS 000534240700001 EID SCOPUS 85085686368 DOI 10.1007/s10921-020-00685-2 Anotace Determination of composition and thickness is crucial for the preparation of thin layers. A separate measurement is possible, however, it could be time-consuming, and each technique requires a specifically prepared sample. Therefore, a combined, fast, and reliable technique would be advantageous. Calibration of energy dispersive X-ray spectroscopy (EDS) integrated with scanning electron microscope (SEM) by X-ray photoelectron spectroscopy (XPS), weighting balance and atomic force microscopy (AFM) were performed for simultaneous and non-destructive concentration, area density and thickness measurements of MnSi and MnGe thin layers prepared by a reactive pulsed laser deposition (PLD). The linearity of calibrations was supported by Monte Carlo calculations. The calibrations enabled the evaluation of Mn concentration with a deviation better than 2.7 at.%. The area density was determined with a deviation better than 6.8 µg/cm2, and the thickness was determined with a deviation better than 4.1 nm for samples measured with a standard substrate. The thickness measurement calibration omitting the standard substrate measurement resulted in the higher deviation of 7.6 nm, however, it enabled double sample throughput and spatial analyses.
Pracoviště Ústav chemických procesů Kontakt Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Rok sběru 2022 Elektronická adresa http://hdl.handle.net/11104/0318917
Počet záznamů: 1