Počet záznamů: 1
Treatment of surfaces with low-energy electrons
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SYSNO ASEP 0474781 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Treatment of surfaces with low-energy electrons Tvůrce(i) Frank, Luděk (UPT-D) RID, SAI, ORCID
Mikmeková, Eliška (UPT-D) RID
Lejeune, M. (FR)Celkový počet autorů 3 Zdroj.dok. Applied Surface Science. - : Elsevier - ISSN 0169-4332
Roč. 407, JUN 15 (2017), s. 105-108Poč.str. 4 s. Forma vydání Tištěná - P Jazyk dok. eng - angličtina Země vyd. NL - Nizozemsko Klíč. slova Low-energy electrons ; Electron beam induced release ; Graphene ; Ultimate cleaning of surfaces Vědní obor RIV JA - Elektronika a optoelektronika, elektrotechnika Obor OECD Nano-processes (applications on nano-scale) CEP TE01020118 GA TA ČR - Technologická agentura ČR LO1212 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy ED0017/01/01 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy Institucionální podpora UPT-D - RVO:68081731 UT WOS 000399507700014 EID SCOPUS 85014012530 DOI 10.1016/j.apsusc.2017.02.131 Anotace Electron-beam-induced deposition of various materials from suitable precursors has represented an established branch of nanotechnology for more than a decade. A specific alternative is carbon deposition on the basis of hydrocarbons as precursors that has been applied to grow various nanostructures including masks for subsequent technological steps. Our area of study was unintentional electron-beam-induced carbon deposition from spontaneously adsorbed hydrocarbon molecules. This process traditionally constitutes a challenge for scanning electron microscopy practice preventing one from performing any true surface studies outside an ultrahigh vacuum and without in-situ cleaning of samples, and also jeopardising other electron-optical devices such as electron beam lithographs. Here we show that when reducing the energy of irradiating electrons sufficiently, the e-beam-induced deposition can be converted to e-beam-induced release causing desorption of hydrocarbons and ultimate cleaning of surfaces in both an ultrahigh and a standard high vacuum. Using series of experiments with graphene samples, we demonstrate fundamental features of e-beam-induced desorption and present results of checks for possible radiation damage using Raman spectroscopy that led to optimisation of the electron energy for damage-free cleaning. The method of preventing carbon contamination described here paves the way for greatly enhanced surface sensitivity of imaging and substantially reduced demands on vacuum systems for nanotechnological applications. Pracoviště Ústav přístrojové techniky Kontakt Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178 Rok sběru 2018
Počet záznamů: 1