Measurements of current density distribution in shaped e-beam writers

Bok, Jan; Horáček, Miroslav; Kolařík, Vladimír; Urbánek, Michal; Matějka, Milan; Krzyžánek, Vladislav

doi:https://dx.doi.org/10.1016/j.mee.2015.09.013

Počet záznamů: 1

Measurements of current density distribution in shaped e-beam writers

1.

SYSNO ASEP	0454665
Druh ASEP	J - Článek v odborném periodiku
Zařazení RIV	J - Článek v odborném periodiku
Poddruh J	Článek ve WOS
Název	Measurements of current density distribution in shaped e-beam writers
Tvůrce(i)	Bok, Jan (UPT-D)_RID Horáček, Miroslav (UPT-D)_{RID, ORCID, SAI} Kolařík, Vladimír (UPT-D)_{RID, ORCID, SAI} Urbánek, Michal (UPT-D)_RID Matějka, Milan (UPT-D)_{RID, ORCID, SAI} Krzyžánek, Vladislav (UPT-D)_{RID, ORCID, SAI}
Celkový počet autorů	6
Zdroj.dok.	Microelectronic Engineering. - : Elsevier - ISSN 0167-9317 Roč. 149, JAN 5 (2016), s. 117-124
Poč.str.	8 s.
Forma vydání	Tištěná - P
Jazyk dok.	eng - angličtina
Země vyd.	NL - Nizozemsko
Klíč. slova	shaped e-beam writer ; electron beam ; current density
Vědní obor RIV	JB - Senzory, čidla, měření a regulace
CEP	GA14-20012S GA ČR - Grantová agentura ČR
	LO1212 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy
	ED0017/01/01 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy
Institucionální podpora	UPT-D - RVO:68081731
UT WOS	000367420200021
EID SCOPUS	84944145588
DOI	10.1016/j.mee.2015.09.013
Anotace	In this paper, we present four measurement methods for the two-dimensional mapping of the current density distribution in variable-shaped e-beam writers. All the methods use only the native equipment of the e-beam writer which provides the advantage of relatively easy implementation. The first and second measurement methods are based on the knife-edge technique in which the e-beam is scanned in two directions across a Faraday cup opening and across shaping shutters of the forming system, respectively. In the thirdmethod, a phosphor screen is irradiated by a magnified e-beam spot and the current density distribution is represented by the luminescence image on the screen. The fourth method uses electron sensitive resist which is exposed by the e-beam. The developed resist is observed under a microscope and the current density distribution is judged fromthe resist profile. All the methods are demonstrated in an example, compared, and their spatial resolution and accuracy evaluated.
Pracoviště	Ústav přístrojové techniky
Kontakt	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Rok sběru	2016

Počet záznamů: 1