Počet záznamů: 1
On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method
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SYSNO ASEP 0449337 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method Tvůrce(i) Kment, Š. (CZ)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Krysa, C. (CZ)
Sekora, D. (US)
Zlámal, M. (CZ)
Olejníček, Jiří (FZU-D) RID, ORCID
Čada, Martin (FZU-D) RID, ORCID, SAI
Kšírová, Petra (FZU-D) RID, ORCID
Remeš, Zdeněk (FZU-D) RID, ORCID
Schmuki, P. (DE)
Schubert, E. (US)
Zbořil, R. (CZ)Zdroj.dok. Applied Catalysis B - Environmental. - : Elsevier - ISSN 0926-3373
Roč. 165, Apr (2015), s. 344-350Poč.str. 7 s. Jazyk dok. eng - angličtina Země vyd. NL - Nizozemsko Klíč. slova ALD ; HiPIMS ; passivation layer ; photoelectrochemical water splitting ; very thin films Vědní obor RIV BL - Fyzika plazmatu a výboje v plynech CEP GAP108/12/2104 GA ČR - Grantová agentura ČR LH12043 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy Institucionální podpora FZU-D - RVO:68378271 UT WOS 000347584200038 EID SCOPUS 84908627727 DOI 10.1016/j.apcatb.2014.10.015 Anotace Iron oxide (α-Fe2O3) hematite films were prepared by a novel high-power impulse magnetron sputtering method (HiPIMS). Some of the crucial issues of hematite are a large overpotential needed to develop the water oxidation photocurrent onset, high extent of surface defects acting as traps, and a short diffusion length (2–4 nm) of photogenerated holes. We report on minimizing these limits by deposition of highly photoactive nanocrystalline very thin ( 30 nm) absorbing hematite films by HiPIMS and their passivation by ultra-thin ( 2 nm) atomic layer deposited (ALD) isocrystalline alumina oxide (α-Al2O3) films. A new approach of one-step annealing of this bilayer system is introduced. The films were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, and electronic properties. Pracoviště Fyzikální ústav Kontakt Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Rok sběru 2016
Počet záznamů: 1