Počet záznamů: 1
Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system
- 1.
SYSNO ASEP 0432261 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system Tvůrce(i) Potocký, Štěpán (FZU-D) RID, ORCID
Babchenko, Oleg (FZU-D) RID, ORCID
Davydova, Marina (FZU-D) RID, ORCID
Ižák, Tibor (FZU-D) RID
Čada, Martin (FZU-D) RID, ORCID, SAI
Kromka, Alexander (FZU-D) RID, ORCID, SAIZdroj.dok. Japanese Journal of Applied Physics. - : Institute of Physics Publishing - ISSN 0021-4922
Roč. 53, č. 5 (2014), "05FP04-1"-"05FP04-3"Poč.str. 3 s. Jazyk dok. eng - angličtina Země vyd. JP - Japonsko Klíč. slova antenna linear ; CVD system ; plasma Vědní obor RIV BL - Fyzika plazmatu a výboje v plynech CEP TA01011740 GA TA ČR - Technologická agentura ČR GAP205/12/0908 GA ČR - Grantová agentura ČR Institucionální podpora FZU-D - RVO:68378271 UT WOS 000338316200114 EID SCOPUS 84903271835 DOI 10.7567/JJAP.53.05FP04 Anotace Growth of diamond coatings with tunable morphology and concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were studied. The dependence of plasma parameters on gas composition was studied by Langmuir probe measurement. Grown diamond coatings and carbon nanotubes were characterized by scanning electron microscopy and Raman spectroscopy and correlated with process parameters. Well-defined nanocrystalline, polycrystalline, and porous diamond films were prepared. Concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were shown. Pracoviště Fyzikální ústav Kontakt Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Rok sběru 2015
Počet záznamů: 1