Linear antenna microwave surface wave plasma characterization by Langmuir probe

Potocký, Štěpán; Čada, Martin; Babchenko, Oleg; Ižák, Tibor; Kromka, Alexander

Počet záznamů: 1

Linear antenna microwave surface wave plasma characterization by Langmuir probe

1.

SYSNO ASEP	0424648
Druh ASEP	A - Abstrakt
Zařazení RIV	Záznam nebyl označen do RIV
Zařazení RIV	Není vybrán druh dokumentu
Název	Linear antenna microwave surface wave plasma characterization by Langmuir probe
Tvůrce(i)	Potocký, Štěpán (FZU-D)_{RID, ORCID} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Babchenko, Oleg (FZU-D)_{RID, ORCID} Ižák, Tibor (FZU-D)_RID Kromka, Alexander (FZU-D)_{RID, ORCID, SAI}
Zdroj.dok.	4 IC4N (International conference nanoparticles and nanomaterials to nanodevices and nanosystems /4./) Book of Abstracs. - Arlington : University of Texas, 2013 / Meletis E.I. ; Kanellopoulos N. ; Politis C. ; Schommers W. S. 132-132
Poč.str.	1 s.
Akce	IC4N 2013 International conference from nanoparticles and nanomaterials to nanodevices and nanosystems /4./
Datum konání	16.06.2013-20.06.2013
Místo konání	Corfu
Země	GR - Řecko
Typ akce	WRD
Jazyk dok.	eng - angličtina
Země vyd.	US - Spojené státy americké
Klíč. slova	Langmuir probe ; nanocrystalline diamond ; plasma enhanced CVD ; Raman spectroscopy ; SEM
Vědní obor RIV	BL - Fyzika plazmatu a výboje v plynech
CEP	TA01011740 GA TA ČR - Technologická agentura ČR
	LM2011026 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy
	GAP205/12/0908 GA ČR - Grantová agentura ČR
Institucionální podpora	FZU-D - RVO:68378271
Anotace	In the presented work we analyze a MW-SW plasma assisted CVD process during growth of different carbon forms. Spatially and time resolved Langmuir probe measurements were done to calculate plasma temperature, density of species, plasma potentials, etc. Due to a pulse modulation of MW generator measurements were done in the middle of the pulse (at 3 µs). At each of four different distances between antenna and substrate process parameters were varied according to diamond film transformation i) from poly- to nano-crystalline character, ii) from solid layer to porous structure, and iii) from lower to higher deposition speed. Significant influence by plasma temperature and density, especially for process pressures lower than 50 Pa was observed. A complex correlation between process parameters, plasma characteristics and the deposit is studied and used for explanation of different growth regimes.
Pracoviště	Fyzikální ústav
Kontakt	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Rok sběru	2014

Počet záznamů: 1