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Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces
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SYSNO ASEP 0382471 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces Tvůrce(i) Baše, Tomáš (UACH-T) RID, SAI, ORCID
Bastl, Zdeněk (UFCH-W) RID, ORCID
Havránek, Vladimír (UJF-V) RID, SAI, ORCID
Macháček, Jan (UACH-T) RID, ORCID, SAI
Langecker, Jens (UACH-T) SAI
Malina, Václav (URE-Y)Zdroj.dok. Langmuir. - : American Chemical Society - ISSN 0743-7463
Roč. 28, č. 34 (2012), s. 12518-12526Poč.str. 9 s. Jazyk dok. eng - angličtina Země vyd. US - Spojené státy americké Klíč. slova copper surfaces ; carboranethiols ; cluster ; chemisorption ; self-assembled monolayer Vědní obor RIV CA - Anorganická chemie Vědní obor RIV – spolupráce Ústav fyzikální chemie J.Heyrovského - Fyzikální chemie a teoretická chemie CEP GAP205/10/0348 GA ČR - Grantová agentura ČR KAN100400702 GA AV ČR - Akademie věd Institucionální podpora UACH-T - RVO:61388980 ; UFCH-W - RVO:61388955 ; UJF-V - RVO:61389005 ; URE-Y - RVO:67985882 UT WOS 000307988700013 DOI 10.1021/la302334x Anotace Two different positional isomers of 1,2-dicarba-closo-dodecaboranedithiols, 1,2-(HS)(2)-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been investigated as cluster building blocks for self-assembled monolayers (SAMs) on copper surfaces. These two isomers represent a convenient system in which the attachment of SH groups at different positions on the skeleton affects their acidic character and thus also determines their reactivity with a copper surface. Isomer 1 exhibited etching of polycrystalline Cu films, and a detailed investigation of the experimental conditions showed that both the acidic character of SH groups and the presence of oxygen at the copper surface play crucial roles in how the surface reaction proceeds: whether toward a self-assembled monolayer or toward copper film etching. We found that each positional isomer requires completely different conditions for the preparation of a SAM on copper surfaces Both isomers exhibited high capacity to remove oxygen atoms from the surface copper(I) oxide that forms immediately after the exposure of freshly prepared copper films to ambient atmosphere. Isomer 2 showed suppression of Cu film oxidation. A number of methods including X-ray photoelectron spectroscopy (XPS), X-ray Rutherford back scattering (RBS), proton-induced X-ray emission (PIXE) analysis, atomic force microscopy (AFM), cyclic voltammetry, and contact angle measurements were used to investigate the experimental conditions for the preparation of SAMs of both positional isomers on copper surfaces and to shed light on the interaction between these molecules and a polycrystalline copper surface. Pracoviště Ústav anorganické chemie Kontakt Jana Kroneislová, krone@iic.cas.cz, Tel.: 311 236 931 Rok sběru 2013
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