Počet záznamů: 1

Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

SYSNO ASEP	0373839
Druh ASEP	J - Článek v odborném periodiku
Zařazení RIV	J - Článek v odborném periodiku
Poddruh J	Článek ve WOS
Název	Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
Tvůrce(i)	Straňák, V. (DE) Wulff, H. (DE) Bogdanowicz, R. (DE) Drache, S. (DE) Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI} Čada, Martin (FZU-D)_{RID, ORCID, SAI} Tichý, M. (CZ) Hippler, R. (DE)
Zdroj.dok.	European Physical Journal D. - : Springer - ISSN 1434-6060 Roč. 64, 2-3 (2011), 427-435
Poč.str.	9 s.
Jazyk dok.	eng - angličtina
Země vyd.	DE - Německo
Klíč. slova	dual magnetron ; Ti-Cu film ; HiPIMS ; diagnostics ; ion energy
Vědní obor RIV	BH - Optika, masery a lasery
CEP	GAP205/11/0386 GA ČR - Grantová agentura ČR
	GP202/09/P159 GA ČR - Grantová agentura ČR
	KAN301370701 GA AV ČR - Akademie věd
	1M06002 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy
CEZ	AV0Z10100522 - FZU-D (2005-2011)
UT WOS	000296630800029
DOI	10.1140/epjd/e2011-20393-7
Anotace	Properties of different methods of magnetron sputtering (dc-MS, dual-MS and dual-HiPIMS) are studied and compared with respect to intermetallic Ti-Cu film formation. The quality and features of thin films are strongly influenced by the energy of incoming particles. The ion velocity distribution functions (IVDFs) were measured by time-resolved retarding field analyzer (RFA) in the substrate position. Thin films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffractometry (XRD) and X-ray reflectometry (XR). It was found that IVDFs measured in pulsed discharges exhibit double-peak distribution. The IVDFs reach the maximum at ion energies about ~8 eV. The ion saturated current is highest in dual-HiPIMS discharge (~5 μA/cm2) and is mostly represented by Cu+ and Ar+ ions. The mode of sputtering influences chemical composition. The copper forms polycrystalline fcc-phase while much smaller Ti particles enwraps the copper crystallites or are part of a solid solution.
Pracoviště	Fyzikální ústav
Kontakt	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Rok sběru	2012

Počet záznamů: 1