Počet záznamů: 1  

Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs

  1. 1.
    SYSNO ASEP0359582
    Druh ASEPJ - Článek v odborném periodiku
    Zařazení RIVJ - Článek v odborném periodiku
    Poddruh JČlánek ve WOS
    NázevTime-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs
    Tvůrce(i) Straňák, V. (DE)
    Drache, S. (DE)
    Čada, Martin (FZU-D) RID, ORCID, SAI
    Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
    Tichý, M. (CZ)
    Hippler, R. (DE)
    Zdroj.dok.Contributions to Plasma Physics. - : Wiley - ISSN 0863-1042
    Roč. 51, 2-3 (2011), s. 237-245
    Poč.str.9 s.
    Jazyk dok.eng - angličtina
    Země vyd.DE - Německo
    Klíč. slovatime-resolved plasma diagnostics ; optical emission spectroscopy ; Langmuir probe ; magnetron sputtering
    Vědní obor RIVBH - Optika, masery a lasery
    CEPKAN301370701 GA AV ČR - Akademie věd
    GP202/09/P159 GA ČR - Grantová agentura ČR
    KJB100100805 GA AV ČR - Akademie věd
    1M06002 GA MŠMT - Ministerstvo školství, mládeže a tělovýchovy
    GA202/09/0800 GA ČR - Grantová agentura ČR
    CEZAV0Z10100522 - FZU-D (2005-2011)
    UT WOS000288610800020
    DOI10.1002/ctpp.201000065
    AnotaceTime-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 μs and 500 μs between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz and duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters.
    PracovištěFyzikální ústav
    KontaktKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Rok sběru2012
Počet záznamů: 1  

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