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A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength
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SYSNO ASEP 0350331 Druh ASEP J - Článek v odborném periodiku Zařazení RIV J - Článek v odborném periodiku Poddruh J Článek ve WOS Název A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength Tvůrce(i) Wachulak, P.W. (PL)
Bartnik, A. (PL)
Fiedorowicz, H. (PL)
Feigl, T. (DE)
Jarocki, R. (PL)
Kostecki, J. (PL)
Rudawski, P. (PL)
Sawicka, Magdalena (FZU-D) RID
Szczurek, M. (PL)
Szczurek, A. (PL)
Zawadzki, Z. (PL)Zdroj.dok. Applied Physics B-Lasers and Optics. - : Springer - ISSN 0946-2171
Roč. 100, č. 3 (2010), 461-469Poč.str. 9 s. Jazyk dok. eng - angličtina Země vyd. DE - Německo Klíč. slova laser-plasma ; EUV source ; gas puff target ; elliptical multi-layer ; mirror ; table-top setup Vědní obor RIV BH - Optika, masery a lasery CEZ AV0Z10100523 - FZU-D (2005-2011) UT WOS 000280842400004 DOI 10.1007/s00340-010-4076-9 Anotace A compact, high-repetition table-top EUV source, based on a gas-puff target, is presented. This source was developed in our group and is capable of emitting quasimonochromatic radiation at 13.8 nm wavelength with the inverse relative bandwidth of 140 and pulse energies up to ~1.3 μJ/pulse at 10-Hz repetition rate. The source is debrisfree, operates near the lithographic wavelengths and offers the energy density of ~0.4 mJ/cm2 in each EUV pulse. These three features make the source attractive for lithographic experiments. Pracoviště Fyzikální ústav Kontakt Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Rok sběru 2011
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