Počet záznamů: 1

The plasma-polymerized films of dichloro(methyl)phenylsilane

SYSNO ASEP	0205323
Druh ASEP	J - Článek v odborném periodiku
Zařazení RIV	J - Článek v odborném periodiku
Poddruh J	Ostatní články
Název	The plasma-polymerized films of dichloro(methyl)phenylsilane
Tvůrce(i)	Čech, V. (CZ) Horvath, P. (CZ) Zemek, J. (CZ) Trchová, M. (CZ) Matějková, Jiřina (UPT-D)
Zdroj.dok.	Czechoslovak Journal of Physics. - : Springer - ISSN 0011-4626 Roč. 50, Supp. S3 (2000), s. 356-364
Poč.str.	9 s.
Akce	Plasma Physics and Technology /10./
Datum konání	06.07.2000-09.07.2000
Místo konání	Praha
Země	CZ - Česká republika
Jazyk dok.	eng - angličtina
Země vyd.	CZ - Česká republika
Vědní obor RIV	JR - Ostatní strojírenství
CEP	GV106/98/K013 GA ČR - Grantová agentura ČR
	GA104/00/0708 GA ČR - Grantová agentura ČR
CEZ	AV0Z2065902 - UPT-D
Anotace	Thin plasma polymer films were deposited from a mixture of dichloro(methyl)phenylsilan (DCMPS) vapour and gaseous hydrogen in a r.f. (13.56 MHz) capacitive coupling deposition system on pieces of silicon wafers. Some samples were annealed in vacuum at the temperature ranging from 450 to 700 Celsius degrees. Chemical composition, structure and surface morphology of annealed samples and those stored in air at room temperature were studied by FTIR, XPS, SEM, and optical microscopy. Termal stability and a decomposition of the plasma polymer with increasing temperature were characterized by termogravimetry together with mass spectrometry. The plasma polymer was stable up to a temperature of 300 Celsius degrees. Above that temperature the material started to decompose together with additional cross-linking due to incorporation of extra oxygen atoms forming new siloxane bonds. The plasma polymer was tough at room temperature but much more brittle at elevated temperatures.
Pracoviště	Ústav přístrojové techniky
Kontakt	Martina Šillerová, sillerova@ISIBrno.Cz, Tel.: 541 514 178
Rok sběru	2001

Počet záznamů: 1