Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO.sub.2./sub. layers

Hippler, R. - Hubička, Zdeněk - Čada, Martin - Kšírová, Petra - Wulff, H. - Helm, C.A. - Straňák, V.
Angular dependence of plasma parameters and film properties during high power impulse magnetron sputtering for deposition of Ti and TiO₂ layers.
Journal of Applied Physics. Roč. 121, č. 17 (2017), s. 1-9, č. článku 171906. ISSN 0021-8979. E-ISSN 1089-7550
Obor OECD: Fluids and plasma physics (including surface physics)
Impakt faktor: 2.176, rok: 2017
http://hdl.handle.net/11104/0281685