LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition

Stuchlík, Jiří - Ledinský, Martin - Honda, Shinya - Drbohlav, Ivo - Mates, Tomáš - Fejfar, Antonín - Hruška, Karel - Stuchlíková, The-Ha - Kočka, Jan
LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition.
Thin Solid Films. Roč. 517, č. 24 (2009), s. 6829-6832. ISSN 0040-6090. E-ISSN 1879-2731
Impakt faktor: 1.727, rok: 2009
http://hdl.handle.net/11104/0180823