Plasma treatment and annealing of ZnO thin films

0477992 - FZÚ 2018 RIV SK eng C - Konferenční příspěvek (zahraniční konf.)
Chang, Yu-Ying - Remeš, Zdeněk
Plasma treatment and annealing of ZnO thin films.
Extended Abstract Book of 9th Conference Solid State Surfaces and Interfaces. Bratislava: Comenius University, 2016 - (Brunner, R.), s. 68-69. ISBN 978-80-223-4203-2.
[Conference Solid State Surfaces and Interfaces /9./ (SSSI 2016). Piestany (SK), 21.11.2016-24.11.2016]
Grant CEP: GA ČR GC16-10429J
Grant ostatní: AV ČR(CZ) KONNECT-007
Program: Bilaterální spolupráce
Institucionální podpora: RVO:68378271
Klíčová slova: ZnO * reactive magnetron sputtering * hydrogen plasma treatment
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)

The modification of the electrical and optical properties of ZnO by annealing and plasma treatment has been investigated extensively. After hydrogen plasma treatment, the increase of the infrared optical absorption, related to free carrier concentration, is detected below the optical absorption edge. The increase of the optical absorption correlates with the increase of the electrical conductivity related to the increase of the free carrier concentration. On the other hand, after oxidation and thermal annealing in air, the optical absorption is significantly reduced in the infrared region and the electrical resistivity increases.

Trvalý link: http://hdl.handle.net/11104/0274220