Počet záznamů: 1
Magnetron sputtered Hf-B-Si-C-N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance
- 1.0489160 - ÚJF 2019 RIV CH eng J - Článek v odborném periodiku
Šímová, V. - Vlček, J. - Zuzjaková, Š. - Houška, J. - Shen, Y. - Jiang, J. C. - Meletis, E. I. - Peřina, Vratislav
Magnetron sputtered Hf-B-Si-C-N films with controlled electrical conductivity and optical transparency, and with ultrahigh oxidation resistance.
Thin Solid Films. Roč. 653, č. 5 (2018), s. 333-340. ISSN 0040-6090. E-ISSN 1879-2731
Grant CEP: GA MŠMT LM2015056
Institucionální podpora: RVO:61389005
Klíčová slova: Hf-B-Si-C-N films * pulsed reactive magnetron sputtering * electrical conductivitiy * optical transparency * high-temperature oxidation resistance
Obor OECD: Nuclear physics
Impakt faktor: 1.888, rok: 2018
Trvalý link: http://hdl.handle.net/11104/0283663
Počet záznamů: 1