Počet záznamů: 1
Deposition of oxide nanostructures by nanosecond laser ablation of silicon in an oxygen-containing background gas
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$a 10.1134/S0869864321040089 $2 DOI 100 $a 20220915d m y slo 03 ba 101 0-
$a eng 102 $a RU 200 1-
$a Deposition of oxide nanostructures by nanosecond laser ablation of silicon in an oxygen-containing background gas 215 $a 6 s. 463 -1
$1 001 cav_un_epca*0362626 $1 011 $a 0869-8643 $e 1531-8699 $1 200 1 $a Thermophysics and Aeromechanics $v Roč. 28, č. 4 (2021), s. 549-554 608 $a Article 610 $a pulsed laser deposition 610 $a thin films 610 $a non-stoichiometric silicon oxide 610 $a laser ablation in background gas 700 -1
$3 cav_un_auth*0276736 $a Rodionov $b A.A. $y RU 701 -1
$3 cav_un_auth*0314165 $a Starinskiy $b S.V. $y RU 701 -1
$3 cav_un_auth*0314166 $a Shukhov $b Y.G. $y RU 701 -1
$3 cav_un_auth*0363377 $a Bulgakov $b Alexander $p FZU-D $i Centrum HiLASE $j HiLASE Centre $y RU $T Fyzikální ústav AV ČR, v. v. i. 856 $u https://doi.org/10.1134/S0869864321040089 $9 RIV
Počet záznamů: 1