Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H.sub.2./sub.S gas mixture

Hubička, Z., Čada, M., Kapran, A., Olejníček, J., Kšírová, P., Zanáška, M., Adámek, P., Tichý, M. Plasma diagnostics in reactive high-power impulse magnetron sputtering system working in Ar + H₂S gas mixture. Coatings. 2020, 10(3), 1-17), 246. E-ISSN 2079-6412. Dostupné z: doi: 10.3390/coatings10030246.